SC-MSC Magnetron Sputtering Coating System

The Magnetron Ion Sputtering Coater is designed for high-quality metal film deposition using magnetron sputtering technology. It enables uniform coating of metals on sample surfaces and is widely used in materials science, electron microscopy sample preparation, and semiconductor processing.

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Product Overview

Technical Specifications

Product Advantages

Product Applications

Product Overview

Technical Specifications

Specification	Details
Vacuum System	Rotary mechanical pump (high power)
Ultimate Vacuum	2 Pa
Pumping Speed	50Hz: 8 m³/h; 60Hz: 9.6 m³/h
Sputtering Current	Max 100 mA
Sputtering Pressure	20 Pa – 8 Pa
Vacuum Time
Vacuum Gauge	Digital gauge, range 2×10³ mbar
Coating Materials	Nickel, Gold, Silver, Platinum
Film Thickness	50 - 120 nm (thickness gauge required)
Sample Size	Diameter ≤ 50 ± 0.1 mm (single layer)
Sample Quantity	1 piece
Power Supply	AC 220V / 50Hz
Power Consumption
Cooling Method	Water cooling (optional)
Dimensions	360 × 300 × 380 mm
Weight	45 kg

Product Advantages

•    Magnetron sputtering for stable and uniform coating
•    Compatible with various metal materials
•    Easy operation for research and teaching use
•    Fast vacuum pumping for efficient workflow
•    Compact design suitable for limited lab space
•    Optional water cooling for enhanced stability

Product Applications

•    Materials research and surface treatment
•    Electron microscopy sample preparation
•    Semiconductor device fabrication
•    Metal film electrode production
•    Laboratory teaching and research in universities

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