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Magnetron Ion Sputter Coater SC-2000

Magnetron Ion Sputter Coater SC-2000

The Magnetron Ion Sputtering Coater is designed for high-quality metal film deposition using magnetron sputtering technology. It enables uniform coating of metals on sample surfaces and is widely used in materials science, electron microscopy sample preparation, and semiconductor processing.
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Product Overview

Technical Specifications

Product Advantages

Product Applications

Product Overview

The Magnetron Ion Sputtering Coater is designed for high-quality metal film deposition using magnetron sputtering technology. It enables uniform coating of metals on sample surfaces and is widely used in materials science, electron microscopy sample preparation, and semiconductor processing.

Technical Specifications

Item SC-2000
Model SC-2000
Coating Method Magnetron Ion Sputtering
Vacuum System Dual-stage Rotary Vacuum Pump
Ultimate Vacuum ≤ 5 Pa
Working Vacuum Range 20 Pa – 80 Pa
Sputtering Current 0 – 100 mA Adjustable
Chamber Size φ150 × 120 mm
Target Size φ50 × 0.1 mm
Compatible Targets Au / Ag / Pt / Pd
Pump-down Time < 5 min
Time Control Digital Timer Control
Power Supply AC 220V / 50Hz
Power Consumption < 1500W
Cooling Method Air Cooling / Optional Water Cooling
Equipment Size Approx. 450 × 360 × 380 mm
Application Environment Laboratory / Research Institute / University

Product Advantages

1. High Uniformity Magnetron Sputtering Technology

Advanced magnetron plasma design improves plasma density and coating uniformity, delivering fine and stable metal film deposition.

2. Compact Bench-Top Design

Small footprint and integrated structure make the SC-2000 ideal for laboratory desktop environments with easy installation and maintenance.

3. Easy Operation

Equipped with an intuitive control panel and digital timer system for convenient parameter adjustment and efficient operation.

4. Stable Vacuum System

High-performance vacuum system ensures rapid evacuation speed and stable chamber pressure for reliable coating quality and repeatability.

5. Multiple Target Compatibility

Supports various sputtering targets including Gold (Au), Silver (Ag), Platinum (Pt), and Palladium (Pd).

6. Wide Application Range

Suitable for material science, nanotechnology, biological samples, electronic components, powders, and surface analysis applications.

Product Applications

SEM Sample Preparation

Provides conductive coating for scanning electron microscope (SEM) samples, improving image clarity and reducing charging effects.

Nanomaterial Research

Suitable for nanomaterials, nanoparticles, thin films, and advanced functional materials.

Biological Sample Coating

Ideal for coating biological tissues, cells, and non-conductive biological samples.

Electronic Component Analysis

Widely used in chip analysis, PCB inspection, electrode materials, and electronic device research.

Advanced Material Development

Applicable to ceramics, polymers, composite materials, and various surface modification studies.

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