SC-ISC Ion Sputter Coater

The Ion Sputtering Coater is designed for sample preparation in electron microscopy. It uses ion sputtering technology to deposit conductive metal films on specimen surfaces, enhancing imaging quality. With a compact structure and user-friendly operation, it is ideal for research institutes, university labs, and materials analysis applications.

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Product Overview

Technical Specifications

Product Advantages

Product Applications

Product Overview

Technical Specifications

Specification	Details
Vacuum Pump Type	Original rotary vane pump
Pumping Speed	50Hz: 8 m³/h; 60Hz: 9.6 m³/h
Ultimate Vacuum	≤ 2 Pa
Discharge Current	0 - 20 mA
Discharge Pressure	30 - 7 Pa
Vacuum Time
Chamber Size	Diameter 120 mm, height 2×10³ mbar
Target Size	Diameter 50 mm
Sample Stage Size	Φ15 - 120 mm (adjustable with scale)
Coating Materials	Au, Pt, Pd, Ag, Cu
Stage Rotation Speed	0 - 1.0 mm/min (continuously adjustable)
Power Supply	AC 220V / 50Hz
Power Consumption	1500W
Cooling Method	Air cooling
Dimensions	360 × 300 × 380 mm
Weight	45 kg

Product Advantages

• Stable and uniform ion sputtering coating
• Compatible with multiple metal materials
• Adjustable sample stage for various specimen sizes
• Fast vacuum pumping for efficient workflow
• Easy operation for research and teaching use
• Air cooling system for reliable performance and easy maintenance

Product Applications

• Electron microscopy sample preparation
• Surface conductivity enhancement
• Metal film deposition experiments
• Teaching demonstrations in universities and research labs
• Pre-treatment for electrochemical analysis

SC-MSC Magnetron Sputtering Coating System

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